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Material Analysis

 

Nano Calc Thin Film Reflectometry System

  • Analysis of single o multi-layer (3) thin film
  • Resolution up to 0.1nm
  • Film thickness from 10nm to 20 mm
  • In-line measurement

Optional: Simultaneously ITO subtrate transmission spectrum measurement

Remark custom specification are possible

 

 

 

Mirocspot Measurement

The adaptation of the NanoCalc system to a microscope allows to reduce the
measurement spotsize to be as small as 4μm or even below depending on the used
microscope magnification. When using a microscope setup, exact measurement
position can also be inspected visually for better understanding of sample
surface structure

 

 

 

Mapping Stage

In combination with the NanoCalc-Mapping software module this allows to generate 3D profile results to control easily the homogeneity of the layer/coating thickness on the sample.

 

 

 

SpecEi Ellipsometer System

Wavelength range:

380-780 nm ( Std ) or 450-900 nm ( Opt )

Optical resolution:

4.0 nm FWHM

Accuracy :

0.1 nm thickness ; 0.005% Refractive index

Incident angle:

70°

Film thickness:

1-5000 nm ( single transparent film)

Measuring spot:

2 mm x 4 mm ( Std ) or 200 μm x 400 μm ( Opt)

Tact time:

3-15 sec ( minimum )

Layers :

32 (Max)

 

 

 

KP Technology - Kelvin Probe

    The Kelvin Probe is a non-contact, non-destructive measurement device used to investigate properties of materials. It is based on a vibrating capacitor and measures the work function difference, or for non-metals, the surface potential, between a conducting specimen and a vibrating tip.

    Typical applications are

  • Corrosion
  • Surface Photovoltage
  • Thin Films
  • Materials Processing
  • Semiconductors
  • Solar Cells
  • Nanotechnology
  • Optoelectronics
  • Sensors
  • Biotechnology

 

Bona Fide Instruments
213-215, Photonics Center, HKSP
Shatin, Hong Kong
Email: contact@bonafide.com.hk
Tel:(852) 2345 2355 Fax: (852) 2345 2377